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Sticking coefficient of the SiH2 free radical on a hydrogenated silicon‐carbon surface
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10.1063/1.101442
/content/aip/journal/apl/54/2/10.1063/1.101442
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/2/10.1063/1.101442
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/content/aip/journal/apl/54/2/10.1063/1.101442
1989-01-09
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Sticking coefficient of the SiH2 free radical on a hydrogenated silicon‐carbon surface
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/2/10.1063/1.101442
10.1063/1.101442
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