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Field‐induced segregation effects during secondary‐ion mass spectrometry depth profiling of Cu and Na implanted in silicon
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10.1063/1.101505
/content/aip/journal/apl/54/20/10.1063/1.101505
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/20/10.1063/1.101505
/content/aip/journal/apl/54/20/10.1063/1.101505
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/content/aip/journal/apl/54/20/10.1063/1.101505
1989-05-15
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Field‐induced segregation effects during secondary‐ion mass spectrometry depth profiling of Cu and Na implanted in silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/20/10.1063/1.101505
10.1063/1.101505
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