1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Silicon loss and transient etch rate in selective reactive ion etching of oxide overlayers
Rent:
Rent this article for
USD
10.1063/1.100673
/content/aip/journal/apl/54/26/10.1063/1.100673
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/26/10.1063/1.100673
Loading

Article metrics loading...

/content/aip/journal/apl/54/26/10.1063/1.100673
1989-06-26
2014-04-16
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Silicon loss and transient etch rate in selective reactive ion etching of oxide overlayers
http://aip.metastore.ingenta.com/content/aip/journal/apl/54/26/10.1063/1.100673
10.1063/1.100673
SEARCH_EXPAND_ITEM