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Superhigh‐rate plasma jet etching of silicon
1.See, e.g., VLSI Electronics Microstructure Science, edited by N. G. Einspruch and D. M. Brown (Academic, Orlando, 1984), Vol. 8.
2.C. M. Horwitz, S. Boronkay, M. Gross, and K. Davies, J. Vac. Sci. Technol. A 6, 1837 (1988).
3.J. D. Chin, J. Vac. Sci. Technol. A 6, 1379 (1988).
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5.L. Bárdoš and V. Dušek, J. Non‐Cryst. Solids97/98, 281 (1987).
6.L. Bárdoš and V. Dušek, Proceedings of the International Symposium on Plasma Chemistry, Tokyo, 1987, edited by K. Akashi and A. Kinbara, p. 1177.
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