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Sequential surface chemical reaction limited growth of high quality Al2O3 dielectrics
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10.1063/1.102337
/content/aip/journal/apl/55/19/10.1063/1.102337
http://aip.metastore.ingenta.com/content/aip/journal/apl/55/19/10.1063/1.102337
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/content/aip/journal/apl/55/19/10.1063/1.102337
1989-11-06
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Sequential surface chemical reaction limited growth of high quality Al2O3 dielectrics
http://aip.metastore.ingenta.com/content/aip/journal/apl/55/19/10.1063/1.102337
10.1063/1.102337
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