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Sequential Ar‐O2 sputtering of Y2O3, BaF2, and CuO targets for preparation of Y‐Ba‐Cu‐O superconducting films without wet‐O2 annealing
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10.1063/1.102294
/content/aip/journal/apl/55/23/10.1063/1.102294
http://aip.metastore.ingenta.com/content/aip/journal/apl/55/23/10.1063/1.102294
/content/aip/journal/apl/55/23/10.1063/1.102294
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/content/aip/journal/apl/55/23/10.1063/1.102294
1989-12-04
2014-09-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Sequential Ar‐O2 sputtering of Y2O3, BaF2, and CuO targets for preparation of Y‐Ba‐Cu‐O superconducting films without wet‐O2 annealing
http://aip.metastore.ingenta.com/content/aip/journal/apl/55/23/10.1063/1.102294
10.1063/1.102294
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