1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Etch rate enhancement of photoresist in nitrogen‐containing plasmas
Rent:
Rent this article for
USD
10.1063/1.102007
/content/aip/journal/apl/55/24/10.1063/1.102007
http://aip.metastore.ingenta.com/content/aip/journal/apl/55/24/10.1063/1.102007
Loading

Article metrics loading...

/content/aip/journal/apl/55/24/10.1063/1.102007
1989-12-11
2014-04-20
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Etch rate enhancement of photoresist in nitrogen‐containing plasmas
http://aip.metastore.ingenta.com/content/aip/journal/apl/55/24/10.1063/1.102007
10.1063/1.102007
SEARCH_EXPAND_ITEM