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Investigation of oxide particles in Czochralski silicon heat treated for intrinsic gettering using scanning infrared microscopy
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10.1063/1.101956
/content/aip/journal/apl/55/25/10.1063/1.101956
http://aip.metastore.ingenta.com/content/aip/journal/apl/55/25/10.1063/1.101956
/content/aip/journal/apl/55/25/10.1063/1.101956
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/content/aip/journal/apl/55/25/10.1063/1.101956
1989-12-18
2014-07-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Investigation of oxide particles in Czochralski silicon heat treated for intrinsic gettering using scanning infrared microscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/55/25/10.1063/1.101956
10.1063/1.101956
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