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Rapid thermal anneal of hydrogen‐implanted metal‐silicon nitride‐silicon dioxide‐silicon structure
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10.1063/1.103201
/content/aip/journal/apl/56/14/10.1063/1.103201
http://aip.metastore.ingenta.com/content/aip/journal/apl/56/14/10.1063/1.103201
/content/aip/journal/apl/56/14/10.1063/1.103201
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/content/aip/journal/apl/56/14/10.1063/1.103201
1990-04-02
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Rapid thermal anneal of hydrogen‐implanted metal‐silicon nitride‐silicon dioxide‐silicon structure
http://aip.metastore.ingenta.com/content/aip/journal/apl/56/14/10.1063/1.103201
10.1063/1.103201
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