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Investigation of fluorine in SiO2 and on Si surface by the 1 9F(p,αγ)1 6O reaction, secondary‐ion mass spectrometry, and x‐ray photoelectron spectroscopy
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10.1063/1.103206
/content/aip/journal/apl/56/15/10.1063/1.103206
http://aip.metastore.ingenta.com/content/aip/journal/apl/56/15/10.1063/1.103206
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/content/aip/journal/apl/56/15/10.1063/1.103206
1990-04-09
2014-09-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Investigation of fluorine in SiO2 and on Si surface by the 19F(p,αγ)16O reaction, secondary‐ion mass spectrometry, and x‐ray photoelectron spectroscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/56/15/10.1063/1.103206
10.1063/1.103206
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