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Planar stress relaxation in solid phase epitaxial CaF2 films grown on (111)Si by i n s i t u rapid isothermal processing
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10.1063/1.103215
/content/aip/journal/apl/56/16/10.1063/1.103215
http://aip.metastore.ingenta.com/content/aip/journal/apl/56/16/10.1063/1.103215
/content/aip/journal/apl/56/16/10.1063/1.103215
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/content/aip/journal/apl/56/16/10.1063/1.103215
1990-04-16
2014-12-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Planar stress relaxation in solid phase epitaxial CaF2 films grown on (111)Si by insitu rapid isothermal processing
http://aip.metastore.ingenta.com/content/aip/journal/apl/56/16/10.1063/1.103215
10.1063/1.103215
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