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Dielectric breakdown in thin Si oxynitride films produced by rapid thermal processing
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10.1063/1.103234
/content/aip/journal/apl/56/21/10.1063/1.103234
http://aip.metastore.ingenta.com/content/aip/journal/apl/56/21/10.1063/1.103234
/content/aip/journal/apl/56/21/10.1063/1.103234
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/content/aip/journal/apl/56/21/10.1063/1.103234
1990-05-21
2014-12-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Dielectric breakdown in thin Si oxynitride films produced by rapid thermal processing
http://aip.metastore.ingenta.com/content/aip/journal/apl/56/21/10.1063/1.103234
10.1063/1.103234
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