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Submicron pattern etching of GaAs by in situ electron beam lithography using a pattern generator
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10.1063/1.103551
/content/aip/journal/apl/57/10/10.1063/1.103551
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/10/10.1063/1.103551
/content/aip/journal/apl/57/10/10.1063/1.103551
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/content/aip/journal/apl/57/10/10.1063/1.103551
1990-09-03
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Submicron pattern etching of GaAs by in situ electron beam lithography using a pattern generator
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/10/10.1063/1.103551
10.1063/1.103551
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