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In situ x‐ray photoelectron spectroscopy and reflection high‐energy electron diffraction study of diethylgalliumchloride adsorption on Si (100) and Si (111) surfaces
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10.1063/1.104050
/content/aip/journal/apl/57/17/10.1063/1.104050
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/17/10.1063/1.104050
/content/aip/journal/apl/57/17/10.1063/1.104050
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/content/aip/journal/apl/57/17/10.1063/1.104050
1990-10-22
2014-09-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Insitu x‐ray photoelectron spectroscopy and reflection high‐energy electron diffraction study of diethylgalliumchloride adsorption on Si (100) and Si (111) surfaces
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/17/10.1063/1.104050
10.1063/1.104050
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