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Tantalum as a diffusion barrier between copper and silicon
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10.1063/1.104051
/content/aip/journal/apl/57/17/10.1063/1.104051
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/17/10.1063/1.104051
/content/aip/journal/apl/57/17/10.1063/1.104051
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/content/aip/journal/apl/57/17/10.1063/1.104051
1990-10-22
2014-08-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Tantalum as a diffusion barrier between copper and silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/17/10.1063/1.104051
10.1063/1.104051
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