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Extremely thin and defect‐free Si‐on‐insulator fabrication by tunnel epitaxy
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10.1063/1.103770
/content/aip/journal/apl/57/26/10.1063/1.103770
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/26/10.1063/1.103770
/content/aip/journal/apl/57/26/10.1063/1.103770
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/content/aip/journal/apl/57/26/10.1063/1.103770
1990-12-24
2014-12-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Extremely thin and defect‐free Si‐on‐insulator fabrication by tunnel epitaxy
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/26/10.1063/1.103770
10.1063/1.103770
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