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Composition and growth kinetics of ultrathin SiO2 films formed by oxidizing Si substrates in N2O
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10.1063/1.104199
/content/aip/journal/apl/57/26/10.1063/1.104199
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/26/10.1063/1.104199
/content/aip/journal/apl/57/26/10.1063/1.104199
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/content/aip/journal/apl/57/26/10.1063/1.104199
1990-12-24
2014-10-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Composition and growth kinetics of ultrathin SiO2 films formed by oxidizing Si substrates in N2O
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/26/10.1063/1.104199
10.1063/1.104199
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