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Selective chemical vapor deposition of tungsten using WF6 and GeH4
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10.1063/1.103690
/content/aip/journal/apl/57/4/10.1063/1.103690
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/4/10.1063/1.103690
/content/aip/journal/apl/57/4/10.1063/1.103690
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/content/aip/journal/apl/57/4/10.1063/1.103690
1990-07-23
2014-10-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Selective chemical vapor deposition of tungsten using WF6 and GeH4
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/4/10.1063/1.103690
10.1063/1.103690
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