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Pulsed laser heating measurement of relaxation‐induced melting point increase in amorphous Si
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10.1063/1.103614
/content/aip/journal/apl/57/6/10.1063/1.103614
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/6/10.1063/1.103614
/content/aip/journal/apl/57/6/10.1063/1.103614
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/content/aip/journal/apl/57/6/10.1063/1.103614
1990-08-06
2014-09-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Pulsed laser heating measurement of relaxation‐induced melting point increase in amorphous Si
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/6/10.1063/1.103614
10.1063/1.103614
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