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Fabrication of ultrasmall Nb‐AlO x ‐Nb Josephson tunnel junctions
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1.For a recent review see D. Averin and K. Likharev, to appear in Mesoscopic Phenomena in Solids, edited by P. Lee and R. Webb (Elsevier, Amsterdam, 1990, to be published).
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6.Photoresist was Shipley 1400‐31, dyed photoresist was Shipley 1413‐J2, developer was Shipley CD‐30, and stripper was Shipley 140. This information does not constitute an endorsement of Shipley products by NIST. Products by other manufacturers may work as well or better.
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