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Reduction reaction of native oxide at the initial stage of GeH4 chemical vapor deposition on (100) Si
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10.1063/1.104248
/content/aip/journal/apl/57/6/10.1063/1.104248
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/6/10.1063/1.104248
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/content/aip/journal/apl/57/6/10.1063/1.104248
1990-08-06
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reduction reaction of native oxide at the initial stage of GeH4 chemical vapor deposition on (100) Si
http://aip.metastore.ingenta.com/content/aip/journal/apl/57/6/10.1063/1.104248
10.1063/1.104248
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