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Use of methane in an electron cyclotron resonance plasma source for carbon delta‐doping in GaAs molecular beam epitaxy
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10.1063/1.105182
/content/aip/journal/apl/58/14/10.1063/1.105182
http://aip.metastore.ingenta.com/content/aip/journal/apl/58/14/10.1063/1.105182
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/content/aip/journal/apl/58/14/10.1063/1.105182
1991-04-08
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Use of methane in an electron cyclotron resonance plasma source for carbon delta‐doping in GaAs molecular beam epitaxy
http://aip.metastore.ingenta.com/content/aip/journal/apl/58/14/10.1063/1.105182
10.1063/1.105182
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