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Sub‐30 nm lithography in a negative electron beam resist with a vacuum scanning tunneling microscope
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10.1063/1.104841
/content/aip/journal/apl/58/22/10.1063/1.104841
http://aip.metastore.ingenta.com/content/aip/journal/apl/58/22/10.1063/1.104841
/content/aip/journal/apl/58/22/10.1063/1.104841
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/content/aip/journal/apl/58/22/10.1063/1.104841
1991-06-03
2014-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Sub‐30 nm lithography in a negative electron beam resist with a vacuum scanning tunneling microscope
http://aip.metastore.ingenta.com/content/aip/journal/apl/58/22/10.1063/1.104841
10.1063/1.104841
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