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In situ stress measurements of ion‐assisted MgF2 and SiO x thin films
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10.1063/1.104855
/content/aip/journal/apl/58/22/10.1063/1.104855
http://aip.metastore.ingenta.com/content/aip/journal/apl/58/22/10.1063/1.104855
/content/aip/journal/apl/58/22/10.1063/1.104855
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/content/aip/journal/apl/58/22/10.1063/1.104855
1991-06-03
2014-09-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Insitu stress measurements of ion‐assisted MgF2 and SiOx thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/58/22/10.1063/1.104855
10.1063/1.104855
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