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Effects of low‐dose Si implantation damage on diffusion of phosphorus and arsenic in Si
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10.1063/1.104530
/content/aip/journal/apl/58/7/10.1063/1.104530
http://aip.metastore.ingenta.com/content/aip/journal/apl/58/7/10.1063/1.104530
/content/aip/journal/apl/58/7/10.1063/1.104530
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/content/aip/journal/apl/58/7/10.1063/1.104530
1991-02-18
2014-07-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of low‐dose Si implantation damage on diffusion of phosphorus and arsenic in Si
http://aip.metastore.ingenta.com/content/aip/journal/apl/58/7/10.1063/1.104530
10.1063/1.104530
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