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Hydrocarbon reaction with HF‐cleaned Si(100) and effects on metal‐oxide‐semiconductor device quality
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10.1063/1.105560
/content/aip/journal/apl/59/1/10.1063/1.105560
http://aip.metastore.ingenta.com/content/aip/journal/apl/59/1/10.1063/1.105560
/content/aip/journal/apl/59/1/10.1063/1.105560
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/content/aip/journal/apl/59/1/10.1063/1.105560
1991-07-01
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hydrocarbon reaction with HF‐cleaned Si(100) and effects on metal‐oxide‐semiconductor device quality
http://aip.metastore.ingenta.com/content/aip/journal/apl/59/1/10.1063/1.105560
10.1063/1.105560
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