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50 nm linewidth platinum sidewall lithography by effusive‐source metal precursor chemical deposition and ion‐assisted etching
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10.1063/1.106070
/content/aip/journal/apl/59/17/10.1063/1.106070
http://aip.metastore.ingenta.com/content/aip/journal/apl/59/17/10.1063/1.106070
/content/aip/journal/apl/59/17/10.1063/1.106070
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/content/aip/journal/apl/59/17/10.1063/1.106070
1991-10-21
2014-07-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: 50 nm linewidth platinum sidewall lithography by effusive‐source metal precursor chemical deposition and ion‐assisted etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/59/17/10.1063/1.106070
10.1063/1.106070
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