1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Si and GaAs dry etching utilizing showered electron‐beam assisted etching through Cl2 gas
Rent:
Rent this article for
USD
10.1063/1.106044
/content/aip/journal/apl/59/18/10.1063/1.106044
http://aip.metastore.ingenta.com/content/aip/journal/apl/59/18/10.1063/1.106044
/content/aip/journal/apl/59/18/10.1063/1.106044
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/59/18/10.1063/1.106044
1991-10-28
2014-09-18
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Si and GaAs dry etching utilizing showered electron‐beam assisted etching through Cl2 gas
http://aip.metastore.ingenta.com/content/aip/journal/apl/59/18/10.1063/1.106044
10.1063/1.106044
SEARCH_EXPAND_ITEM