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Influence of silicon oxide on the morphology of HF‐etched Si(111) surfaces: Thermal versus chemical oxide
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10.1063/1.105814
/content/aip/journal/apl/59/23/10.1063/1.105814
http://aip.metastore.ingenta.com/content/aip/journal/apl/59/23/10.1063/1.105814
/content/aip/journal/apl/59/23/10.1063/1.105814
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/content/aip/journal/apl/59/23/10.1063/1.105814
1991-12-02
2014-10-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of silicon oxide on the morphology of HF‐etched Si(111) surfaces: Thermal versus chemical oxide
http://aip.metastore.ingenta.com/content/aip/journal/apl/59/23/10.1063/1.105814
10.1063/1.105814
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