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Formation of monolithic masks for 0.25 μm x‐ray lithography
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10.1063/1.105778
/content/aip/journal/apl/59/24/10.1063/1.105778
http://aip.metastore.ingenta.com/content/aip/journal/apl/59/24/10.1063/1.105778
/content/aip/journal/apl/59/24/10.1063/1.105778
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/content/aip/journal/apl/59/24/10.1063/1.105778
1991-12-09
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Formation of monolithic masks for 0.25 μm x‐ray lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/59/24/10.1063/1.105778
10.1063/1.105778
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