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Enhanced growth of device‐quality copper by hydrogen plasma‐assisted chemical vapor deposition
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10.1063/1.106773
/content/aip/journal/apl/60/25/10.1063/1.106773
http://aip.metastore.ingenta.com/content/aip/journal/apl/60/25/10.1063/1.106773
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/content/aip/journal/apl/60/25/10.1063/1.106773
1992-06-22
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhanced growth of device‐quality copper by hydrogen plasma‐assisted chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/60/25/10.1063/1.106773
10.1063/1.106773
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