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Chemical vapor deposition of diamond films from water vapor rf‐plasma discharges
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10.1063/1.106668
/content/aip/journal/apl/60/3/10.1063/1.106668
http://aip.metastore.ingenta.com/content/aip/journal/apl/60/3/10.1063/1.106668
/content/aip/journal/apl/60/3/10.1063/1.106668
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/content/aip/journal/apl/60/3/10.1063/1.106668
1992-01-20
2014-11-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Chemical vapor deposition of diamond films from water vapor rf‐plasma discharges
http://aip.metastore.ingenta.com/content/aip/journal/apl/60/3/10.1063/1.106668
10.1063/1.106668
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