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Selective and epitaxial deposition of β‐FeSi2 on silicon by rapid thermal processing‐chemical vapor deposition using a solid iron source
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10.1063/1.106473
/content/aip/journal/apl/60/8/10.1063/1.106473
http://aip.metastore.ingenta.com/content/aip/journal/apl/60/8/10.1063/1.106473
/content/aip/journal/apl/60/8/10.1063/1.106473
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/content/aip/journal/apl/60/8/10.1063/1.106473
1992-02-24
2014-11-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Selective and epitaxial deposition of β‐FeSi2 on silicon by rapid thermal processing‐chemical vapor deposition using a solid iron source
http://aip.metastore.ingenta.com/content/aip/journal/apl/60/8/10.1063/1.106473
10.1063/1.106473
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