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Physical model for defect mediated boron diffusion during rapid thermal annealing of ion implanted BF2
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10.1063/1.107650
/content/aip/journal/apl/61/1/10.1063/1.107650
http://aip.metastore.ingenta.com/content/aip/journal/apl/61/1/10.1063/1.107650
/content/aip/journal/apl/61/1/10.1063/1.107650
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/content/aip/journal/apl/61/1/10.1063/1.107650
1992-07-06
2014-09-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Physical model for defect mediated boron diffusion during rapid thermal annealing of ion implanted BF2
http://aip.metastore.ingenta.com/content/aip/journal/apl/61/1/10.1063/1.107650
10.1063/1.107650
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