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Tri‐isopropyl gallium: A very promising precursor for chemical beam epitaxy
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10.1063/1.107939
/content/aip/journal/apl/61/3/10.1063/1.107939
http://aip.metastore.ingenta.com/content/aip/journal/apl/61/3/10.1063/1.107939
/content/aip/journal/apl/61/3/10.1063/1.107939
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/content/aip/journal/apl/61/3/10.1063/1.107939
1992-07-20
2014-08-27
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Scitation: Tri‐isopropyl gallium: A very promising precursor for chemical beam epitaxy
http://aip.metastore.ingenta.com/content/aip/journal/apl/61/3/10.1063/1.107939
10.1063/1.107939
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