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Highly accurate etching of ridge‐waveguide directional couplers using in situ reflectance monitoring and periodic multilayers
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10.1063/1.108805
/content/aip/journal/apl/62/1/10.1063/1.108805
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/1/10.1063/1.108805
/content/aip/journal/apl/62/1/10.1063/1.108805
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/content/aip/journal/apl/62/1/10.1063/1.108805
1993-01-04
2014-08-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Highly accurate etching of ridge‐waveguide directional couplers using insitu reflectance monitoring and periodic multilayers
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/1/10.1063/1.108805
10.1063/1.108805
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