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Generation of dc substrate current in metal‐oxide‐semiconductor structures under an oscillating gate voltage
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10.1063/1.108822
/content/aip/journal/apl/62/1/10.1063/1.108822
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/1/10.1063/1.108822
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/content/aip/journal/apl/62/1/10.1063/1.108822
1993-01-04
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Generation of dc substrate current in metal‐oxide‐semiconductor structures under an oscillating gate voltage
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/1/10.1063/1.108822
10.1063/1.108822
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