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Semi‐insulating crystalline silicon formed by oxygen doping during low‐temperature chemical vapor deposition
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10.1063/1.108755
/content/aip/journal/apl/62/10/10.1063/1.108755
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/10/10.1063/1.108755
/content/aip/journal/apl/62/10/10.1063/1.108755
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/content/aip/journal/apl/62/10/10.1063/1.108755
1993-03-08
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Semi‐insulating crystalline silicon formed by oxygen doping during low‐temperature chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/10/10.1063/1.108755
10.1063/1.108755
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