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Defect generation sensitivity depth profile in buried SiO2 using Ar plasma exposure
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10.1063/1.109394
/content/aip/journal/apl/62/18/10.1063/1.109394
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/18/10.1063/1.109394
/content/aip/journal/apl/62/18/10.1063/1.109394
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/content/aip/journal/apl/62/18/10.1063/1.109394
1993-05-03
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Defect generation sensitivity depth profile in buried SiO2 using Ar plasma exposure
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/18/10.1063/1.109394
10.1063/1.109394
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