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Water trapping of point defects in interlayer SiO2 films and its contribution to the reduction of hot‐carrier degradation
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10.1063/1.109391
/content/aip/journal/apl/62/19/10.1063/1.109391
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/19/10.1063/1.109391
/content/aip/journal/apl/62/19/10.1063/1.109391
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/content/aip/journal/apl/62/19/10.1063/1.109391
1993-05-10
2014-08-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Water trapping of point defects in interlayer SiO2 films and its contribution to the reduction of hot‐carrier degradation
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/19/10.1063/1.109391
10.1063/1.109391
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