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Selective etching of InP and InGaAsP over AlInAs using CH4/H2 reactive ion etching
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10.1063/1.109125
/content/aip/journal/apl/62/24/10.1063/1.109125
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/24/10.1063/1.109125
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/content/aip/journal/apl/62/24/10.1063/1.109125
1993-06-14
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Selective etching of InP and InGaAsP over AlInAs using CH4/H2 reactive ion etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/24/10.1063/1.109125
10.1063/1.109125
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