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Chemical vapor deposition of silicon carbide thin films on titanium carbide, using 1,3 disilacyclobutane
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10.1063/1.109147
/content/aip/journal/apl/62/24/10.1063/1.109147
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/24/10.1063/1.109147
/content/aip/journal/apl/62/24/10.1063/1.109147
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/content/aip/journal/apl/62/24/10.1063/1.109147
1993-06-14
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Chemical vapor deposition of silicon carbide thin films on titanium carbide, using 1,3 disilacyclobutane
http://aip.metastore.ingenta.com/content/aip/journal/apl/62/24/10.1063/1.109147
10.1063/1.109147
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