No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Metalorganic chemical vapor deposition of TiN films for advanced metallization
1.S. M. Rossnagal, D. Mikalsen, H. Kinoshita, and J. J. Cuomo, J. Vac. Sci. Technol. A 9, 261 (1991).
2.D. C. Bradley and I. M. Thomas, J. Chem. Soc. 1960, 3857.
3.R. M. Fix, R. G. Gordon, and D. M. Hoffman, Mater. Res. Soc. Smp. Proc. 168, 357 (1990).
4.K. Ishihara, K. Yamazaki, H. Hamada, K. Kamisako, and Y. Tarui, Jpn. J. Appl. Phys. 29, 2103 (1990).
5.G. S. Sandhu and T. T. Doan, Advanced Metallization for ULSI Applications, edited by V. Rana, R. Joshi, and I. Ohdamari (Materials Research Society, Pittsburgh, PA, 1992), p. 323.
Article metrics loading...
Full text loading...
Most read this month
Most cited this month