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Novel short‐gas‐residence‐time electron cyclotron resonance plasma etching
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10.1063/1.110647
/content/aip/journal/apl/63/14/10.1063/1.110647
http://aip.metastore.ingenta.com/content/aip/journal/apl/63/14/10.1063/1.110647
/content/aip/journal/apl/63/14/10.1063/1.110647
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/content/aip/journal/apl/63/14/10.1063/1.110647
1993-10-04
2014-09-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Novel short‐gas‐residence‐time electron cyclotron resonance plasma etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/63/14/10.1063/1.110647
10.1063/1.110647
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