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Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino)silane and ozone
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10.1063/1.109965
/content/aip/journal/apl/63/5/10.1063/1.109965
http://aip.metastore.ingenta.com/content/aip/journal/apl/63/5/10.1063/1.109965
/content/aip/journal/apl/63/5/10.1063/1.109965
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/content/aip/journal/apl/63/5/10.1063/1.109965
1993-08-02
2014-12-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino)silane and ozone
http://aip.metastore.ingenta.com/content/aip/journal/apl/63/5/10.1063/1.109965
10.1063/1.109965
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