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Vertical and lateral hole aluminum filling characteristics employing electron cyclotron resonance plasma sputtering with high magnetic field
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10.1063/1.109945
/content/aip/journal/apl/63/6/10.1063/1.109945
http://aip.metastore.ingenta.com/content/aip/journal/apl/63/6/10.1063/1.109945
/content/aip/journal/apl/63/6/10.1063/1.109945
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/content/aip/journal/apl/63/6/10.1063/1.109945
1993-08-09
2014-07-14
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Vertical and lateral hole aluminum filling characteristics employing electron cyclotron resonance plasma sputtering with high magnetic field
http://aip.metastore.ingenta.com/content/aip/journal/apl/63/6/10.1063/1.109945
10.1063/1.109945
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