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Degradation mechanisms and improvement of thermal stability of CoSi2/polycrystalline Si layers
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10.1063/1.111873
/content/aip/journal/apl/64/12/10.1063/1.111873
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/12/10.1063/1.111873
/content/aip/journal/apl/64/12/10.1063/1.111873
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/content/aip/journal/apl/64/12/10.1063/1.111873
1994-03-21
2014-12-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Degradation mechanisms and improvement of thermal stability of CoSi2/polycrystalline Si layers
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/12/10.1063/1.111873
10.1063/1.111873
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