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New microfabrication technique by synchrotron radiation‐excited etching: Use of noncontact mask on a submicrometer scale
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10.1063/1.111822
/content/aip/journal/apl/64/13/10.1063/1.111822
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/13/10.1063/1.111822
/content/aip/journal/apl/64/13/10.1063/1.111822
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/content/aip/journal/apl/64/13/10.1063/1.111822
1994-03-28
2014-09-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: New microfabrication technique by synchrotron radiation‐excited etching: Use of noncontact mask on a submicrometer scale
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/13/10.1063/1.111822
10.1063/1.111822
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