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Reactive ion etching of high‐aspect‐ratio 100 nm linewidth features in tungsten
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10.1063/1.111666
/content/aip/journal/apl/64/16/10.1063/1.111666
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/16/10.1063/1.111666
/content/aip/journal/apl/64/16/10.1063/1.111666
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/content/aip/journal/apl/64/16/10.1063/1.111666
1994-04-18
2014-10-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reactive ion etching of high‐aspect‐ratio 100 nm linewidth features in tungsten
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/16/10.1063/1.111666
10.1063/1.111666
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