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Activation energy for Ostwald ripening of Al2Cu in Al(4 wt. % Cu) thin films using a lateral diffusion couple
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10.1063/1.111423
/content/aip/journal/apl/64/22/10.1063/1.111423
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/22/10.1063/1.111423
/content/aip/journal/apl/64/22/10.1063/1.111423
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/content/aip/journal/apl/64/22/10.1063/1.111423
1994-05-30
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Activation energy for Ostwald ripening of Al2Cu in Al(4 wt. % Cu) thin films using a lateral diffusion couple
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/22/10.1063/1.111423
10.1063/1.111423
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